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Released: 01.05.2016
ASTM F1709-97R16 - Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
CURRENCY
| Standard number: | F1709-97R16 |
| Released: | 01.05.2016 |
| Status: | Active |
| Pages: | 3 |
| Section: | 10.04 |
| Keywords: | coating; sputtering; target; thin film; titanium ; |
DESCRIPTION
1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.
1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.
1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.