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Homepage>ISO Standards>ISO 14606:2022-Surface chemical analysis-Sputter depth profiling
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download between 0-24 hoursReleased: 2022
ISO 14606:2022-Surface chemical analysis-Sputter depth profiling

ISO 14606:2022

ISO 14606:2022-Surface chemical analysis-Sputter depth profiling

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Standard´s number:ISO 14606:2022
Pages:17
Edition:3
Released:2022
Language:English
DESCRIPTION

ISO 14606:2022


This document gives guidance and requirements on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials, in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry. This document is not intended to cover the use of special multilayered systems such as delta doped layers.