Don't have a credit card? Never mind we support BANK TRANSFER .

PRICES include / exclude VAT
>ISO Standards>ISO 16531:2013-Surface chemical analysis-Depth profiling-Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Not available online - contact us!
immediate downloadReleased: 2013
ISO 16531:2013-Surface chemical analysis-Depth profiling-Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

ISO 16531:2013

Surface chemical analysis

CURRENCY
132 EUR
Standard´s number:ISO 16531:2013
Pages:18
Edition:1
Released:2013
Language:English
DESCRIPTION

ISO 16531:2013


ISO 16531:2013 specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy and X-ray photoelectron spectroscopy. These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size below ~1 mm in diameter. The methods do not include depth resolution optimization.