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>BSI Standards >01 GENERALITIES. TERMINOLOGY. STANDARDIZATION. DOCUMENTATION>01.080 Graphical symbols>01.080.99 Other graphical symbols>BS EN 62047-22:2014 Semiconductor devices. Micro-electromechanical devices Electromechanical tensile test method for conductive thin films on flexible substrates
immediate downloadReleased: 2014-10-31
BS EN 62047-22:2014 Semiconductor devices. Micro-electromechanical devices Electromechanical tensile test method for conductive thin films on flexible substrates

BS EN 62047-22:2014

Semiconductor devices. Micro-electromechanical devices Electromechanical tensile test method for conductive thin films on flexible substrates

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Standard number:BS EN 62047-22:2014
Pages:14
Released:2014-10-31
ISBN:978 0 580 77555 0
Status:Standard
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BS EN 62047-22:2014


This standard BS EN 62047-22:2014 Semiconductor devices. Micro-electromechanical devices is classified in these ICS categories:
  • 31.080.99 Other semiconductor devices
  • 01.080.99 Other graphical symbols

This part of IEC 62047 specifies a tensile test method to measure electromechanical properties of conductive thin micro-electromechanical systems (MEMS) materials bonded on non-conductive flexible substrates. Conductive thin-film structures on flexible substrates are extensively utilized in MEMS, consumer products, and flexible electronics. The electrical behaviours of films on flexible substrates differ from those of freestanding films and substrates due to their interfacial interactions. Different combinations of flexible substrates and thin films often lead to various influences on the test results depending on the test conditions and the interfacial adhesion. The desired thickness of a thin MEMS material is 50 times thinner than that of the flexible substrate, whereas all other dimensions are similar to each other.