Don't have a credit card? Never mind we support BANK TRANSFER .

PRICES include / exclude VAT
>BSI Standards >71 CHEMICAL TECHNOLOGY>71.040 Analytical chemistry>71.040.40 Chemical analysis>BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
immediate downloadReleased: 2010-08-31
BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

BS ISO 14237:2010

Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials

Format
Availability
Price and currency
English Secure PDF
Immediate download
Printable - You are authorized to print 1 copy
246.40 EUR
English Hardcopy
In stock
246.40 EUR
Standard number:BS ISO 14237:2010
Pages:30
Released:2010-08-31
ISBN:978 0 580 57402 3
Status:Standard
DESCRIPTION

BS ISO 14237:2010


This standard BS ISO 14237:2010 Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials is classified in these ICS categories:
  • 71.040.40 Chemical analysis

This International Standard specifies a secondary-ion mass spectrometric method for the determination of boron atomic concentration in single-crystalline silicon using uniformly doped materials calibrated by a certified reference material implanted with boron. This method is applicable to uniformly doped boron in the concentration range from 1 × 1016 atoms/cm3 to 1 × 1020 atoms/cm3.