PRICES include / exclude VAT
Homepage>BS Standards>71 CHEMICAL TECHNOLOGY>71.040 Analytical chemistry>71.040.40 Chemical analysis>BS ISO 16531:2020 Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
Sponsored link
immediate downloadReleased: 2020-10-06
BS ISO 16531:2020 Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

BS ISO 16531:2020

Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

Format
Availability
Price and currency
English Secure PDF
Immediate download
270.40 USD
You can read the standard for 1 hour. More information in the category: E-reading
Reading the standard
for 1 hour
27.04 USD
You can read the standard for 24 hours. More information in the category: E-reading
Reading the standard
for 24 hours
81.12 USD
English Hardcopy
In stock
270.40 USD
Standard number:BS ISO 16531:2020
Pages:28
Released:2020-10-06
ISBN:978 0 539 05785 0
Status:Standard
DESCRIPTION

BS ISO 16531:2020


This standard BS ISO 16531:2020 Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS is classified in these ICS categories:
  • 71.040.40 Chemical analysis

This document specifies methods for the alignment of the ion beam to ensure good depth resolution in sputter depth profiling and optimal cleaning of surfaces when using inert gas ions in Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS). These methods are of two types: one involves a Faraday cup to measure the ion current; the other involves imaging methods. The Faraday cup method also specifies the measurements of current density and current distributions in ion beams. The methods are applicable for ion guns with beams with a spot size less than or equal to 1 mm in diameter. The methods do not include depth resolution optimization.