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71.040.40 Chemical analysis
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PD ISO/TS 15338:2025 - TC
Tracked Changes. Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
Tracked Changes. Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
Released: 2025-03-13
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PD ISO/TS 25138:2025 - TC
Tracked Changes. Surface chemical analysis. Analysis of metal oxide films by glow discharge optical emission spectrometry
Tracked Changes. Surface chemical analysis. Analysis of metal oxide films by glow discharge optical emission spectrometry
Released: 2025-03-07
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PD ISO/TS 15338:2025
Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
Surface chemical analysis. Glow discharge mass spectrometry. Operating procedures
Released: 2025-03-11
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BS EN 12698-2:2007
Chemical analysis of nitride bonded silicon carbide refractories XRD methods
Chemical analysis of nitride bonded silicon carbide refractories XRD methods
Released: 2007-05-31
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BS ISO 14237:2010
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Released: 2010-08-31
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BS EN 61207-6:2015
Expression of performance of gas analyzers Photometric analyzers
Expression of performance of gas analyzers Photometric analyzers
Released: 2015-01-31
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BS EN ISO 6145-10:2008
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Permeation method
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Permeation method
Released: 2009-02-28
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BS EN ISO 6145-11:2008
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Electrochemical generation
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Electrochemical generation
Released: 2009-06-30
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BS ISO 14706:2014
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Released: 2014-07-31
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BS ISO 18516:2006
Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution
Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution
Released: 2006-11-30
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