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71.040.40 Chemical analysis
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BS ISO 14237:2010
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Surface chemical analysis. Secondary-ion mass spectrometry. Determination of boron atomic concentration in silicon using uniformly doped materials
Released: 2010-08-31
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BS EN ISO 6145-11:2008
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Electrochemical generation
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Electrochemical generation
Released: 2009-06-30
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BS ISO 14706:2014
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
Released: 2014-07-31
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PD ISO/TR 19319:2013
Surface chemical analysis. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
Surface chemical analysis. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
Released: 2013-03-31
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BS ISO 21270:2004
Surface chemical analysis. X-ray photoelectron and Auger electron spectrometers. Linearity of intensity scale
Surface chemical analysis. X-ray photoelectron and Auger electron spectrometers. Linearity of intensity scale
Released: 2005-03-31
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BS ISO 24237:2005
Surface chemical analysis. X-ray photoelectron spectroscopy. Repeatability and constancy of intensity scale
Surface chemical analysis. X-ray photoelectron spectroscopy. Repeatability and constancy of intensity scale
Released: 2005-09-11
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BS ISO 18516:2006
Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution
Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Determination of lateral resolution
Released: 2006-11-30
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PD ISO/TR 22335:2007
Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer
Surface chemical analysis. Depth profiling. Measurement of sputtering rate. Mesh-replica method using a mechanical stylus profilometer
Released: 2007-08-31
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DD ISO/TS 29041:2008
Gas mixtures. Gravimetric preparation. Mastering correlations in composition
Gas mixtures. Gravimetric preparation. Mastering correlations in composition
Released: 2009-02-28
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BS EN ISO 6145-6:2017
Gas analysis. Preparation of calibration gas mixtures using dynamic methods Critical flow orifices
Gas analysis. Preparation of calibration gas mixtures using dynamic methods Critical flow orifices
Released: 2017-09-04
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