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download between 0-24 hoursReleased: 2019
ISO 21859:2019
ISO 21859:2019-Fine ceramics (advanced ceramics, advanced technical ceramics)-Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
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| Standard´s number: | ISO 21859:2019 |
| Pages: | 4 |
| Edition: | 1 |
| Released: | 2019 |
| Language: | English |
DESCRIPTION
ISO 21859:2019
This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.