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Main page>ISO Standards>25>25.220>25.220.40>ISO 25164:2026 - Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification
immediate downloadReleased: 2026-08-03
ISO 25164:2026 - Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification

ISO 25164:2026

ISO 25164:2026 - Physical vapor deposition coatings — Magnetron sputtering deposition of TiAlSiN thin films — Specification

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Standard´s number:ISO 25164:2026
Edition:1
Released:2026-08-03
Pages (English):6
Pages (French):7
DESCRIPTION

ISO 25164:2026

This document specifies the technical requirements for TiAlSiN thin films deposited by magnetron sputtering.

This document is also applicable to the deposition of TiN, TiAlN or TiSiN thin films.