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Homepage>UNE standards>UNE EN 62047-16:2015 Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)
in stockReleased: 2015-08-01
UNE EN 62047-16:2015 Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)

UNE EN 62047-16:2015

Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.)

Dispositivos semiconductores. Dispositivos microelectromecánicos. Parte 16: Métodos de ensayo para determinar la tensión residual de películas MEMS. Métodos de curvatura de la oblea y de deflexión del haz (Ratificada por AENOR en agosto de 2015.)

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Standard number:UNE EN 62047-16:2015
Pages:15
Released:2015-08-01
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This standard UNE EN 62047-16:2015 Semiconductor devices - Micro-electromechanical devices - Part 16: Test methods for determining residual stresses of MEMS films – Wafer curvature and cantilever beam deflection methods (Endorsed by AENOR in August of 2015.) is classified in these ICS categories:

  • 31.080.99