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Homepage>UNE standards>UNE EN 62047-2:2006 Semiconductor devices - Micro-electromechanical devices -- Part 2: Tensile testing method of thin film materials (IEC 62047-2:2006). (Endorsed by AENOR in January of 2007.)
in stockReleased: 2007-01-01
UNE EN 62047-2:2006 Semiconductor devices - Micro-electromechanical devices -- Part 2: Tensile testing method of thin film materials (IEC 62047-2:2006). (Endorsed by AENOR in January of 2007.)

UNE EN 62047-2:2006

Semiconductor devices - Micro-electromechanical devices -- Part 2: Tensile testing method of thin film materials (IEC 62047-2:2006). (Endorsed by AENOR in January of 2007.)

Dispositivos semiconductores. Parte 2: Dispositivos micro-electromecánicos. Métodos de ensayo de tensión de materiales de película fina (IEC 62047-2:2006). (Ratificada por AENOR en enero de 2007.)

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Standard number:UNE EN 62047-2:2006
Pages:17
Released:2007-01-01
DESCRIPTION

This standard UNE EN 62047-2:2006 Semiconductor devices - Micro-electromechanical devices -- Part 2: Tensile testing method of thin film materials (IEC 62047-2:2006). (Endorsed by AENOR in January of 2007.) is classified in these ICS categories:

  • 31.080.99