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Homepage>ASTM Standards>ASTM E2245-11R18 - Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer
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Released: 2018-05-28

ASTM E2245-11R18

Standard Test Method for Residual Strain Measurements of Thin, Reflecting Films Using an Optical Interferometer

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Language:English
Released:2018-05-28
Pages:25
Standards number:ASTM E2245-11R18
Standard number:E2245-11R18
Released:01.05.2018
Status:Active
Pages:25
Section:03.01
Keywords:cantilevers; combined standard uncertainty; fixed-fixed beams; interferometry; length measurements; microelectromechanical systems; MEMS; polysilicon; residual strain; round robin; stiction; strain gradient; test structure;
DESCRIPTION

1.1 This test method covers a procedure for measuring the compressive residual strain in thin films. It applies only to films, such as found in microelectromechanical systems (MEMS) materials, which can be imaged using an optical interferometer, also called an interferometric microscope. Measurements from fixed-fixed beams that are touching the underlying layer are not accepted.

1.2 This test method uses a non-contact optical interferometric microscope with the capability of obtaining topographical 3-D data sets. It is performed in the laboratory.

1.3 This standard does not purport to address all of the safety concerns, if any, associated with its use. It is the responsibility of the user of this standard to establish appropriate safety, health, and environmental practices and determine the applicability of regulatory limitations prior to use.

1.4 This international standard was developed in accordance with internationally recognized principles on standardization established in the Decision on Principles for the Development of International Standards, Guides and Recommendations issued by the World Trade Organization Technical Barriers to Trade (TBT) Committee.