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BS ISO 19318:2021
Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of methods used for charge control and charge correction
Released: 2021-06-16
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PD ISO/TR 15969:2021
Surface chemical analysis. Depth profiling. Measurement of sputtered depth
Surface chemical analysis. Depth profiling. Measurement of sputtered depth
Released: 2021-03-26
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BS ISO 7431-1:2024
Thiourea for industrial use Test methods
Thiourea for industrial use Test methods
Released: 2024-01-24
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BS ISO 6142-2:2024
Gas analysis. Preparation of calibration gas mixtures Gravimetric method for Class II mixtures
Gas analysis. Preparation of calibration gas mixtures Gravimetric method for Class II mixtures
Released: 2024-02-07
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BS ISO 12406:2010
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Released: 2010-11-30
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BS ISO 29081:2010
Surface chemical analysis. Auger electron spectroscopy. Reporting of methods used for charge control and charge correction
Surface chemical analysis. Auger electron spectroscopy. Reporting of methods used for charge control and charge correction
Released: 2010-02-28
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BS ISO 23812:2009
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Released: 2009-05-31
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BS EN ISO 6145-8:2008
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Diffusion method
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Diffusion method
Released: 2009-02-28
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