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71.040.40 Chemical analysis
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BS EN 62703:2013
Expression of performance of fluorometric oxygen analyzers in liquid media
Expression of performance of fluorometric oxygen analyzers in liquid media
Released: 2013-11-30
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BS EN 61207-7:2013
Expression of performance of gas analyzers Tuneable semiconductor laser gas analyzers
Expression of performance of gas analyzers Tuneable semiconductor laser gas analyzers
Released: 2015-07-31
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BS EN 12698-1:2007
Chemical analysis of nitride bonded silicon carbide refractories Chemical methods
Chemical analysis of nitride bonded silicon carbide refractories Chemical methods
Released: 2007-04-30
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BS ISO 7504:2015
Gas analysis. Vocabulary
Gas analysis. Vocabulary
Released: 2015-05-31
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BS 6337-1:1983
General methods of chemical analysis Method for determination of traces of sulphur compounds by reduction and titrimetry
General methods of chemical analysis Method for determination of traces of sulphur compounds by reduction and titrimetry
Released: 1983-01-31
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BS EN ISO 6145-8:2008
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Diffusion method
Gas analysis. Preparation of calibration gas mixtures using dynamic volumetric methods Diffusion method
Released: 2009-02-28
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BS ISO 23812:2009
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
Released: 2009-05-31
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BS ISO 12406:2010
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth profiling of arsenic in silicon
Released: 2010-11-30
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BS ISO 29081:2010
Surface chemical analysis. Auger electron spectroscopy. Reporting of methods used for charge control and charge correction
Surface chemical analysis. Auger electron spectroscopy. Reporting of methods used for charge control and charge correction
Released: 2010-02-28
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